Integrated Ferroelectrics

Journal Title：Integrated Ferroelectrics

Integrated Ferroelectrics provides an international, interdisciplinary forum for electronic engineers and physicists as well as process and systems engineers, ceramicists, and chemists who are involved in research, design, development, manufacturing and utilization of integrated ferroelectric devices. Such devices unite ferroelectric films and semiconductor integrated circuit chips. The result is a new family of electronic devices, which combine the unique nonvolatile memory, pyroelectric, piezoelectric, photorefractive, radiation-hard, acoustic and/or dielectric properties of ferroelectric materials with the dynamic memory, logic and/or amplification properties and miniaturization and low-cost advantages of semiconductor i.c. technology.

《集成铁电体》为电子工程师和物理学家以及参与集成铁电体设备研究、设计、开发、制造和利用的工艺和系统工程师、陶瓷学家和化学家提供了一个国际性的跨学科论坛。此类设备将铁电薄膜和半导体集成电路芯片结合在一起。其结果是产生了一种新型电子设备，它将铁电材料独特的非易失性存储器、热电、压电、光折变、抗辐射、声学和/或介电特性与半导体集成电路技术的动态存储器、逻辑和/或放大特性以及小型化和低成本优势相结合。

Integrated Ferroelectrics创刊于1992年，由Taylor and Francis Ltd.出版商出版，收稿方向涵盖工程技术 - 工程：电子与电气全领域，此期刊水平偏中等偏靠后，在所属细分领域中专业影响力一般，过审相对较易，如果您文章质量佳，选择此期刊，发表机率较高。平均审稿速度 约3.0个月 ，影响因子指数0.7，该期刊近期没有被列入国际期刊预警名单，广大学者值得一试。