Plasma Chemistry And Plasma Processing

Journal Title：Plasma Chemistry And Plasma Processing

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

本期刊发表有关等离子体化学和等离子体处理基础和应用研究的原创论文，范围包括从非热等离子体到热等离子体的处理等离子体、等离子体基础研究以及特定等离子体应用的研究。此类应用包括但不限于等离子体催化、环境处理（包括液体和气体处理）、等离子体的生物应用（包括等离子体医学和农业）、表面改性和沉积、粉末和纳米结构合成、能源应用（包括等离子体燃烧和重整）、资源回收、等离子体与电化学的耦合以及等离子体蚀刻。还征集等离子体化学动力学研究以及等离子体与表面的相互作用。投稿必须充分考虑等离子体的作用，例如相关的等离子体化学、等离子体物理或等离子体-表面相互作用；仅考虑使用等离子体处理的材料或物质的性质的稿件不在本期刊的范围内。

Plasma Chemistry And Plasma Processing创刊于1981年，由Springer US出版商出版，收稿方向涵盖工程技术 - 工程：化工全领域，此刊是中等级别的SCI期刊，所以过审相对来讲不是特别难，但是该刊专业认可度不错，仍然是一本值得选择的SCI期刊 。平均审稿速度 较慢,6-12周 ，影响因子指数2.6，该期刊近期没有被列入国际期刊预警名单，广大学者值得一试。